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3Dresyn NMF-Glass-like hard photopolymer for nano and micro fabrication

Regular price 300.00 €

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3Dresyn NMF-Glass-like has these features and benefits:

  • UV & EB curable organic ultra hard & rigid photopolymer for nano and micro fabrication (photolithography), such as printing of ultra hard & rigid stamps for Nano Imprinting lithography NIL and for hard & rigid negative photoresists for standard UV lithography & PCB technology processing, UV patterning of core and cladding
  • resin with similar properties to quartz glass
  • higher temperature resistance without deflection than PMMA
  • harder and more rigid than PMMA at room and at high temperature
  • UV curable: excellent photoreactivity at 250-410 nm with minimum energy dosage
  • very fast photo curing, ideal for low power light sources
  • Electron beam EB curable
  • compatible and blendable with our 3Dreyns for nano & micro fabrication  
  • extra hard Shore D90
  • biocompatible, ultra safe without any toxic pictograms
  • high tensile and flexural strength >40 MPa
  • high transmittance @ 850 nm
  • rigid (Young modulus >3000 MPa)
  • elongation <1%
  • high temperature resistance up to 290 ºC (short term) without deformation
  • High deflection temperature >290ºC
  • imprint Temperature > 160ºC (short term)
  • synthetic resin source
  • durable
  • medium impact/shattering resistance
  • very low viscosity <500 mPas
  • excellent balance of low viscosity for easy imprinting and low penetration  
  • refractive index 1.48-1.52
  • very high resolution (printing resolution of less than 10 nm)
  • low shrinkage <6%
  • also printable by most commercial and professional SLA, DLP & LCD 3D printers
  • organo-tin free
  • high optical clarity
  • high durability, non degradable
  • excellent bonding, low risk of debonding
  • high mechanical properties, with low risk of cracking
  • very low degassing at high vacuum 
  • low oxygen sensitivity
  • high mechanical stability
  • high chemical resistance
  • long shelf life of 1 year
  • excellent spin coating application 
  • excellent etching with Reactive Ion Etching
  • excellent stability and chemical resistance to a wide range of wet chemistries used in the clean room
  • low penetration
  • low surface tension with good release and demolding properties
  • 100% organic (free of inorganic materials) 
  • contains hydroxyl groups for bonding release agents, such as perfluorodecyltrichlorosilane (FDTS)
  • no thermal treatment is required
  • easy processing with standard lithography equipment
  • easy removal of uncured resin with ketones, alcohols and esters

Applications

  • easy & cost effective transparent mould and stamp fabrication, alternative to quartz or electroplated stamps
  • mass sensors based on UV-NIL, ALD and RIE
  • UV patterning of core and cladding
  • mechanical resonators with reduced dampening of piezoelectric actuators
  • optical Single Mode SM and Multi Mode MM waveguides
  • beam splitters
  • biosensors
  • Fast and contactless prototyping by direct laser writing at 405 nm (200-410 nm) and two photon polymerisation 2PP
  • etch mask for wet and dry etching
  • mould for electroplating
  • optical applications