Advanced photopolymer manufacturing covers high-precision material systems for nano-to-micro fabrication and emerging non-conventional photopolymer-based manufacturing routes. 3Dresyns develops and supplies resin platforms and photoresists designed for precision patterning, high feature fidelity, and adaptation to specific process constraints (light source, wavelength, dose, resolution, and development routes).
This section includes material families for two-photon polymerization (2PP), nanoimprint lithography (NIL) photoresists, and volumetric additive manufacturing (VAM).
Shop by product family
- Shop 2PP resins — materials for two-photon polymerization of nano/microstructures, enabling very high resolution and complex micro-architectures.
- Shop NIL photoresists — UV/EB negative photoresists for nanoimprint lithography (NIL) and related nano/micro fabrication techniques.
- Shop VAM resins — volumetric photopolymer materials designed for VAM workflows where parts can be formed through volumetric light exposure rather than conventional layer-by-layer printing.
Implementation notes
- Printer compatibility, exposure parameters, and post-processing conditions must be validated for each specific printer model, material, and application.
- For nano/micro workflows, resolution and feature fidelity depend strongly on optical setup, wavelength, dose strategy, and development (cleaning, extraction, and post-curing where applicable).
- For VAM workflows, rheology and cure kinetics are typically process-specific; material tuning may be required depending on the volumetric printer design and light engine.
Contact
For guidance on material selection, process adaptation, and custom developments, contact: info@3dresyns.com