UV & EB negative photoresists for Nanoimprint Lithography NIL and other nano & micro fabrication techniques
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Discover our nanoimprint lithography NIL phtopolymer resins for Nano & Micro Fabrication NMF, curable with Ultraviolet and Electron beam UV & EB (including X-ray and Visible spectrum).
Our photocurable 3Dresyns NMF for Nano & Micro Fabrication provide custom control of thermal and mechanical stability of UV & EB spin or drop coatings for the fabrication of transparent polymer stamps, masks, molds, templates, and a broad range of negative photoresists with different physical, mechanical, and chemical resistance properties: from ultra rigid to tough and flexible grades.
Our NMF 3Dresyns are filtered with filters with pore sizes <10 microns, are made to order, and are compatible with most NIL and soft lithography systems.
Our versatile photoreactive 3Dresyns NMF can be used for NIL and soft lithography, as well as for direct SLA, DLP & LCD 3D printing of master molds and of even Microfluidic devices.
Discover our ultra low viscosity 3Dresyns MF for printing Microfluidic devices with ultra high resolution, without the need of casting conventional PDMS.
Our range of soft 3Dresyns NMF PDMS-like can also be used for replacing conventional PDMSs, since they are photocurable after spin coating or drop casting in master molds, as well as 3D printable by SLA, DLP, & LCD.
Discover our NMF resins for nano & micro fabrication with photolithography technologies, such as UV & EB Nanoimprint Lithography, Soft Lithography, and Stereolithography SLA.
Discover the Features & Benefits of our versatile 3Dresyns NMF portfolio for nano & micro fabrication:
fast photocuring with high resolution with wavelengths from 0.01 nm to 420 nm (X-ray-Visible)
photocurable with UV & Visible light sources (including Electron Beam EB)
availability of biobased grades
availability of relatively low* and high viscosity versions:
LV Low Viscosity version for easy rinsing of uncured resin
HV High Viscosity version for reduced penetration and increased thickness of spin coatings
availability of different photocuring speeds:
non reactive for maximum control of photocuring speed
broad range of physical, mechanical, and chemical resistance properties
from ultra rigid to tough and flexible grades
epoxy and BPA free
printable by SLA, DLP & LCD 3D printers
free samples of our Fine Tuners will be sent if necessary for custom adjustment of photocuring speed
Very soft & elastic like silicone, biocompatible, fast curing
*Note 1: All our 3Dresyns NFM contain hydroxyl groups for bonding release agents, such as perfluorodecyltrichlorosilane (FDTS). Altenatively, discover also our dedicated 3Dresyns MF with ultra high resolution and ultra low viscosity for direct printing of Microfluidics with SLA, DLP & LCD printers.
Contact us to consult about our 3Dresyns for UV nano imprinting and your specific performance goals at: info@3Dresyns.com