3Dresyn 2PP IM-HDT-WS, high deflection temperature and water soluble for printing sacrificial materials with two photon polymerization

Product description

3Dresyn 2PP IM-HDT-WS is a high deflection temperature and water soluble photopolymer for printing sacrificial materials with two photon polymerization.

It is designed as a negative photoresist for slow-medium writing speed additive manufacturing of water soluble sacrificial 3D nano and microstructures, offering an excellent balance of resolution and writing speed.

Application framework

Designed for two photon polymerization workflows, including Dip-in two-photon lithography DTPL / Dip-in Laser Lithography DiLL and conventional Two Photon Lithography TPL configurations, for fabrication of water soluble sacrificial 3D nano and microstructures.

Typical applications

• Slow-medium writing speed additive manufacturing of water soluble sacrificial 3D nano and microstructures
• Dip-in two-photon lithography DTPL / Dip-in Laser Lithography DiLL
• Conventional two photon polymerization systems / Two Photon Lithography TPL

Measured mechanical properties

• Tensile strength: <40 MPa (ISO 527-1 / ISO 527-2)
• Flexural strength: <40 MPa (ISO 178)
• Young’s modulus: >3000 MPa (ISO 527)
• Elongation at break: <1% (ISO 527)
• Shore hardness: D85 (ISO 868)

Measured physical properties

• Heat deflection temperature: <190ºC @ 0.45 MPa (ISO 75)
• Viscosity: <150 mPas at 23°C ± 2°C (ISO 3219)
• Shrinkage: <1%
• Optical transparency: 100% from 440 nm onwards into the Near Infrared NIR
• Achievable feature sizes: 100-200 nm
• Water soluble

Functional performance characteristics

• Ideal 2PP photocurable resin negative photoresist for slow-medium writing speed additive manufacturing of water soluble sacrificial 3D nano & microstructures
• Excellent balance of resolution shape accuracy and writing speed
• Photoreactive from 200 to 410 nm with Fine Tuner 2PP FT8 Bio (single 1 photon absorption)
• Photoreactive from 600 to 810 nm with Fine Tuner 2PP FT8 Bio (two photon absorption)
• Medium hardness
• Clear

Processing and handling performance

• Designed for Dip-in two-photon lithography DTPL also referred as Dip-in Laser Lithography DiLL where the 2PP resin is immersed upside down in the microscope objective
• Designed for conventional 2PP systems also refered as Two Photon Lithography TPL where the 2PP resin is positioned upright on the substrate
• Easy handling by direct drop casting
• Excellent adhesion on glass and other substrates
• Printable by most commercial two photon polymerization printers with wavelengths from 600 nm to 800 nm
• Supplied at different writing speeds: fast, intermediate, slow, and non reactive for custom control of writing speed and resolution
• Tunable with the free sampled Fine Tuner 2PP FT8 Bio for custom adjustment of writing speed
• Tunable with the free sampled Fine Tuner 2PP LB3 Bio for maximum resolution with submicron feature sizes
• Supplied in a low viscosity version (<150 mPas) for easy development or cleaning of uncured resin with conventional 2PP upright configurations
• Easy removal of uncured resin with Cleaning Fluid WS1 Bio

Chemical and safety characteristics

• Water soluble
• Organo-tin free

Testing & processing disclaimer

Final writing speed, resolution, feature size, adhesion, printability, solubility and cleaning performance depend on the printer configuration, wavelength, substrate, developer and full processing workflow. Performance must be validated by the user for each specific application.

Disclaimer

This material is supplied as a professional manufacturing material and is not marketed as a finished medical device. Final part performance and suitability must be validated by the user according to the intended application.

Document reference: TDS-3DRESYN-2PP-IM-HDT-WS-EN | Version: 1.0 | Last updated: March 2026