3Dresyn TCR-Fluorosilicone1 is a temperature and chemical resistant fluorosilicone photopolymer designed for nano and micro fabrication workflows requiring soft and elastic performance, excellent chemical resistance to fuels and oils, very high resolution and high optical clarity.
This UV and EB curable soft and elastic photopolymer is intended for applications such as printing of soft and elastic stamps for nano imprinting lithography, soft and elastic negative photoresists for standard UV lithography and PCB technology processing, and UV patterning of core and cladding.



