3Dresyn 2PP IM-HDT-WS is a high deflection temperature and water soluble photopolymer for printing sacrificial materials with two photon polymerization.
It is designed as a negative photoresist for slow-medium writing speed additive manufacturing of water soluble sacrificial 3D nano and microstructures, offering an excellent balance of resolution and writing speed.
Designed for two photon polymerization workflows, including Dip-in two-photon lithography DTPL / Dip-in Laser Lithography DiLL and conventional Two Photon Lithography TPL configurations, for fabrication of water soluble sacrificial 3D nano and microstructures.
Final writing speed, resolution, feature size, adhesion, printability, solubility and cleaning performance depend on the printer configuration, wavelength, substrate, developer and full processing workflow. Performance must be validated by the user for each specific application.
This material is supplied as a professional manufacturing material and is not marketed as a finished medical device. Final part performance and suitability must be validated by the user according to the intended application.
Use these related 3Dresyns pages to navigate adjacent material and process routes within the same technical workflow.
This technical datasheet should be used together with the relevant processing, calibration, safety and workflow documentation available in the 3Dresyns® Resources section.
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