3Dresyn 2PP IM-HDT-WS is our high deflection temperature and water soluble photopolymer for printing sacrificial materials with two photon polymerization.
Features and Benefits:
- ideal 2PP photocurable resin (negative photoresist) for slow-medium writing speed additive manufacturing water soluble sacrificial 3D nano & microstructures
- excellent balance of resolution (shape accuracy) and writing speed
- photoreactive from 200 to 410 nm with Fine Tuner 2PP FT8 Bio (single 1 photon absorption)
- photoreactive from 600 to 810 nm with Fine Tuner 2PP FT8 Bio (two photon absorption)
- 100% optically transparent from 440 nm onwards into the Near Infrared NIR
- achievable feature sizes of 100-200 nm
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designed for Dip-in two-photon lithography DTPL (also referred as Dip-in Laser Lithography DiLL) where the 2PP resin is immersed upside down in the microcope objective
- designed for conventional 2PP systems (also refered as Two Photon Lithography TPL) where the 2PP resin is positioned upright on the substrate
- medium hardness
- easy handling by direct drop casting
- excellent adhesion on glass and other substrates
- soluble in water
- Shore hardness D85
- Heat Deflection Temperature HDT <190ºC@0.45MPa
- clear
- tensile strength, <40 MPa
- flexural strength <40 MPa
- rigid (Young modulus >3000 MPa)
- elongation <1%
- very low viscosity, below 150 cps
- low shrinkage <1%
- organo-tin free
- printable by most commercial two photon polymerization printers with wavelengths from 600 nm to 800 nm
- supplied at different writing speeds: fast, intermediate, slow, and non reactive for custom control of writing speed and resolution
- supplied in a low viscosity version (<150 mPas) for easy development or cleaning of uncured resin with conventional 2PP upright configurations
- easy removal of uncured resin with Cleaning Fluid WS1 Bio
Discover and request our Instructions for Use IFU after ordering. Contact us to consult about our 3Dresyns for 2PP and your specific performance goals at: info@3Dresyns.com
