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UV & EB nanoimprint lithography for nano & micro fabrication

Discover our photocurable 3Dresyn NMF-PDMS-like and  3Dresyn NMF- Glass-like for custom control of thermal and mechanical stability of UV&EB spin coatings for the fabrication of transparent polymer stamps and photoresists.

Discover also the rest of our UV&EB resins for nano & micro fabrication by photolithography technologies, such as UV & EB Nanoimprint Lithography.

3Dresyn NMF-

Properties

Deflection temperature 

Porosity & permeability

Young´s modulus

Shore hardness

% Elongation

% Shrinkage

Glass-like

Ultra hard & rigid

**** very high

* very low

>3000

D90

<1

<6

T1

Tough & semi rigid

*** high

** low

1000-2000

D80

<20

<2

HF1

Hard & flexible

** low

*** high

<1000

D70

<50

<0.5

PDMS-like*

Soft & elastic

* very low

*** high

< 7

A40

>80

<0.1

*Note: 3Dresyn NMF- PDMS-like exhibits lower temperature resistance than conventional RTV silicones. If you need high temperature resistant materials, it is recommended to use high temperature resistant RTV silicones or our made to order 3Dresyn HTR-Silicone1, High Temperature Resistant Silicone

Discover also our made to order 3Dresyn TCR-Fluorosilicone1, Temperature and Chemical Resistant Fluorosilicone

Choose your optimum photo accelerant for your specific needs!

Contact us to consult about our 3Dresyns for UV nano imprinting and your specific performance goals at: info@3Dresyns.com