UV & EB nanoimprint lithography for nano & micro fabrication
Discover our photocurable 3Dresyn NMF-PDMS-like and 3Dresyn NMF- Glass-like for custom control of thermal and mechanical stability of UV&EB spin coatings for the fabrication of transparent polymer stamps and photoresists.
Discover also the rest of our UV&EB resins for nano & micro fabrication by photolithography technologies, such as UV & EB Nanoimprint Lithography.
|
3Dresyn NMF- |
Properties |
Deflection temperature |
Porosity & permeability |
Young´s modulus |
Shore hardness |
% Elongation |
% Shrinkage |
|
Ultra hard & rigid |
**** very high |
* very low |
>3000 |
D90 |
<1 |
<6 |
|
|
Tough & semi rigid |
*** high |
** low |
1000-2000 |
D80 |
<20 |
<2 |
|
|
Hard & flexible |
** low |
*** high |
<1000 |
D70 |
<50 |
<0.5 |
|
|
Soft & elastic |
* very low |
*** high |
< 7 |
A40 |
>80 |
<0.1 |
*Note: 3Dresyn NMF- PDMS-like exhibits lower temperature resistance than conventional RTV silicones. If you need high temperature resistant materials, it is recommended to use high temperature resistant RTV silicones or our made to order 3Dresyn HTR-Silicone1, High Temperature Resistant Silicone
Discover also our made to order 3Dresyn TCR-Fluorosilicone1, Temperature and Chemical Resistant Fluorosilicone
Choose your optimum photo accelerant for your specific needs!
Contact us to consult about our 3Dresyns for UV nano imprinting and your specific performance goals at: info@3Dresyns.com
